Substrate: 300nm silicon wafer with oxide layer
Structure: First peel off the thin layer of black phosphorus to the designated electrode position, and then peel off the covering small layer of InSe to form a heterojunction.
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| Item ID | CAS | ID | Pack | Parameter | Stock | Make up | Price |
| BK2021121045 | BK2021121045 | 1片 | 100 | $937 |
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