product information:
Name: Copper Silicide
Purity: ≥99.5 single phase


Particle size: D50: 5~10 microns


Melting point: 825°C


Density: 7.8g/cm3


Uses: Copper silicide film can be used to passivate copper-based chips, inhibit their diffusion and electron migration, and act as a diffusion barrier. It can also be used to directly synthesize organosilicon compounds in industry. In the reaction, copper silicide can silicify methyl chloride.

Copper silicide (Cu5Si), also known as five copper silicide, is a binary silicon compound of copper.

It is an intermetallic compound, which means that its properties are between ionic compounds and alloys. It has excellent electrical conductivity, thermal conductivity, ductility, corrosion resistance and wear resistance. The copper silicide film can be used to passivate copper-based chips, inhibit their diffusion and electron migration, and act as a diffusion barrier.
Copper silicide can also be used in industry to directly synthesize organic silicon compounds. In the reaction, copper silicide
Can make methyl chloride silicified. For example, industrially useful dimethyldichlorosilane can be produced.
It can also be used in the silicate electronics industry-electric vacuum devices-integrated circuits-ships-automobiles-light industry-aerospace and other scientific and technological fields!

Warm tip: the products supplied by Beijing Beike Xincai Technology Co., Ltd. are only used for scientific research, not for human body

Item ID	Info
BK2020112503-01	CAS：12159-07-8 ID：BK2020112503 Pack：100g/瓶 Parameter：Si 8%~10% Stock：100 Make up： Price：$125