ID：BK2020112503
CAS：12159-07-8
price： $125
Item ID：BK2020112503-01
specification：
5 minutes to choose the product plan
E-mail：mxenes@163.com
product information:
Name: Copper Silicide
Purity: ≥99.5 single phase
Particle size: D50: 5~10 microns
Melting point: 825°C
Density: 7.8g/cm3
Uses: Copper silicide film can be used to passivate copper-based chips, inhibit their diffusion and electron migration, and act as a diffusion barrier. It can also be used to directly synthesize organosilicon compounds in industry. In the reaction, copper silicide can silicify methyl chloride.
Copper silicide (Cu5Si), also known as five copper silicide, is a binary silicon compound of copper.
It is an intermetallic compound, which means that its properties are between ionic compounds and alloys. It has excellent electrical conductivity, thermal conductivity, ductility, corrosion resistance and wear resistance. The copper silicide film can be used to passivate copper-based chips, inhibit their diffusion and electron migration, and act as a diffusion barrier.| Warm tip: the products supplied by Beijing Beike Xincai Technology Co., Ltd. are only used for scientific research, not for human body |
| Item ID | CAS | ID | Pack | Parameter | Stock | Make up | Price |
| BK2020112503-01 | 12159-07-8 | BK2020112503 | 100g/瓶 | Si 8%~10% | 100 | $125 |
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| Reminder: Beijing Beike New Material Technology Co., Ltd. supplies products only for scientific research, not for humans |
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